This video explains the significance of "curvy masks" in TSMC's new 2nm process node (N2). It details how these masks, enabled by Inverse Lithography Technology (ILT) and advanced multi-beam mask writers, allow for more precise chip manufacturing, overcoming limitations of traditional rectilinear ("Manhattan") mask designs. The video also touches on the historical development of mask-making technology, the challenges and solutions in implementing ILT, and the role of GPUs in accelerating the complex computations required.